Ion Gun Model 1420

Adjustable spot size ≥ 5um for spatially defined sputtering or implantation

Emission regulated bombardment provides stable ion current

Continuously variable beam energy 5kV to 20kV

Dual octupole for beam scanning and astigmatism correction

Pre-objective scanning for reduced spot size

No direct filament to sample line of sight to avoid sample contamination

Customer replaceable filaments and beam trimming apertures

Dual filaments provide operational backup in case of filament end of life

All UHV compatible and etch resistant materials used in fabrication

Differential pumping to minimize main chamber gas load

Operates over the range of inert gases and Nitrogen