User replaceable frit ion source allowing production of various ion species

Adjustable spot size from 75um to >1mm for spatially defined sputtering

Continuous variable beam energy up to 5keV

Neutral species suppression using beam bending optics

Beam blanking capability for TOF SIMS

Integral beam current monitoring capability

Option beam bunching electrode

All UHV compatible and etch resistant materials used in fabrication

Pre-objective lens deflection for reduced spot size

Differential pumping to minimize main chamber gas loading