High brightness electron impact source for maximum bulk material removal

Emission regulated bombardment provides stable ion current with front panel adjustable dynamic range x300

Adjustable spot size from 20 mm to > 1 mm for spatially defined sputtering

Continuously variable beam energy up to 5keV

Neutral species suppression using beam bending optics

Beam blanking capability for TOF SIMS

Integral beam current monitoring capability

Replaceable beam trimming aperture with typical life-time of  > 500 hours

Dual filaments provide operational backup with typical filament life-time > 500 hours

Internal source pressure sensor permits monitoring of ion source pressure

All UHV compatible and etch resistant materials used in fabrication

Pre-objective lens deflection for reduced spot size

Differential pumping to minimize main chamber gas loading

Operates over the range of inert gas species