Focusing column optimized for low energy throughput

High brightness electron impact source for maximum bulk material removal

Emission regulated bombardment provides stable ion current with front panel adjustable dynamic range x300

Continuously variable beam energy up to 5keV

Replaceable beam trimming aperture with typical life-time of  > 500 hours

Dual filaments provide operational backup with typical filament life-time > 500 hours

All UHV compatible and etch resistant materials used in fabrication

Operates over the range of inert gas species, Oxygen with optional Thoria filament

3 Degree Bend in Column for Neutral Suppression

2 Stage Differential Pumping for Operation with very low Chamber Pressure