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Ion Gun Model 1401

General Purpose Sputtering, Depth Profiling

Model 1401 is ideal for use in surface chemistry experiments such as sample preparation and depth profiling with Auger and ESCA. It can be used with inert gasses.

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  • High current density 15 to 50 mA/cm² depending on spot size selected.

  • Unique ion source design for stable emission.

  • Dual tungsten filaments with typical filament life-time > 500 hours. Yttria coated iridium optional. Replaceable beam trimming aperture with typical life-time > 500 hours.

  • All UHV compatible and etch resistant materials used in fabrication.

  • Differential pumping to minimize main chamber gas loading.

  • Gun is easily disassembled for maintenance.

  • Electrical connections and gas inlet located on a single flange for easier installation.

  • Preset extraction and condenser lens parameters (three spot size settings) for repeatable operation. Integral beam current measurement.

  • Direct measurement of ion source pressure.

  • System and cable interlocks prevent energizing high voltage with poor vacuum or cable removed.

  • Power supply and raster generator in single 5¼ high 19-inch rack mount enclosure.

  • Digitally generated raster option for uniform etch profile. Computer control option. Optional ion source pressure regulation.

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